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Beilstein J. Nanotechnol. 2017, 8, 784–788, doi:10.3762/bjnano.8.81
Figure 1: AFM images of the photoresist after 120 min of near-field etching with a He–Cd laser (325 nm, 3.81 ...
Figure 2: (a) Photoresist profile before (black) and after 60 min (blue) and 120 min (red) of 325 nm laser il...
Figure 3: (a) Evaluation of surface roughness reduction of 325 nm (purple) and 405 nm (blue) over a 2 h inter...
Figure 4: Absorption spectrum and cross-sectional profile. (a) Photoresist absorption curve, showing that 325...
Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99
Figure 1: (a) Schematic diagram of a dressed photon–phonon (DPP). (b–d) Schematic diagrams of DPP etching. Th...
Figure 2: Typical atomic force microscopy (AFM) images of a type-Ib diamond (111) substrate with a 5 μm × 5 μ...
Figure 3: AFM images of the GaN surface (a) before and (b) after DPP etching. (c) Enlarged view (1.0 μm × 1.0...
Figure 4: (a, b) Schematic diagrams of the DPP etching of substrates with nanostripe patterns. AFM images of ...
Figure 5: AFM images of the alumina substrate surface after RF sputtering (a) without and (b) with visible li...